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IAM星火大讲堂第15期:美国科学院、美国工程院及美国人文与科学院三院院士Tobin J Marks教授做客IAM星火大讲堂
阅读次数:151 添加时间:2019/6/3 发布: 管理员



报 告 人:Tobin J Marks   院士

邀请人:黄维 院士、张仕明 教授

报告题目:Making Flexible, Transparent Electronic Devices a Reality. Organic Polymers and Beyond


       This lecture focuses on the challenging of designing, realizing, understanding, hybridizing, and implementing new, dissimilar materials families for unconventional electronics. Fabrication methodologies to achieve these goals will ultimately include high-throughput, large-area, high-resolution printing and coating techniques.  Materials design topics discussed include: 1. Rationally designed high-mobility p- and n-type soft matter semiconductors for organic CMOS, 2. Self-assembled high-k  dielectrics enabling ultra-large capacitance, low leakage, high break-down fields, minimal trapped interfacial charge, and radiation hardness,  3. Polycrystalline and amorphous oxide semiconductors for printable, transparent, and  mechanically flexible electronics, 4. Hybrid organic + inorganic semiconductors for high carrier mobility, optical transparency, and mechanical flexibility, 5. Combining these materials sets to rapidly fabricate scalable, flexible thin-film transistor-based circuitries and devices.  


       Tobin Marks is Ipatieff Professor of Catalytic Chemistry, Professor of Materials Science and Engineering, Professor of Applied Physics, and Professor of Chemical and Biological Engineering at Northwestern University. He obtained a BS degree in Chemistry from the University of Maryland and a PhD in Inorganic Chemistry from MIT. His major recognitions include the U.S. National Medal of Science, the Spanish Principe de Asturias Prize, the Materials Research Society Von Hippel Award, the Dreyfus Prize in the Chemical Sciences, the National Academy of Sciences Award in Chemical Sciences, the American Chemical Society Joseph Priestley Medal, and the Israel Harvey Prize. He is a member of the U.S., German, Indian, and Italian National Academies of Sciences, the U.S. National Academy of Engineering, the American Academy of Arts and Sciences, and the U.S. National Academy of Inventors.  He is a Fellow of the U.K. Royal Society of Chemistry, the Materials Research Society, and the American Chemical Society.  Marks has published 1350 peer-reviewed articles and holds 205 issued U.S. patents. He holds Honorary Doctorate Degrees from Hong Kong University of Science and Technology, the University of South Carolina, the Ohio State University, and the Technical University of Munich.

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